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Low load nanoindentation into titaniumnitride coating avoids substrate influence |
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The NanoTest instrument was used to perform continuous Depth vs. Load measurements on a sputtered titanium nitride wear-resistant coating. The coating thickness was approximately 2 µm and the substrate material was polished AISI 310 stainless steel. Maximum loads of 20 mN and 100 mN were used to demonstrate the necessity of using shallow indentations Measurement Parameters and Results |
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...to preclude substrate influences with a hard film on a softer substrate, the indentation depth should not exceed approximately 10% of the film thickness...
As can be seen in the figure below, a pronounced change in the slope of the Depth vs. Load curve occurred at an on-load depth of 300 nm, beyond which the substrate contributed significantly to the response. This is substantiated by the derived hardness and Young's modulus results given below, where it is clear that the results for the 20 mN indentation properly describe only the film material.
Hardness and Young's Modulus |
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